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Postdoctoral Researcher in the Development of Thin Films and Deposition Processes using Artificial Intelligence and Autonomous Experiments.

EMPA

Suiza📅 28/9/2026

Descripción

Postdoctoral Researcher in the Development of Thin Films and Deposition Processes using Artificial Intelligence and Autonomous Experiments. Materials science and technology are our passion. With our cutting\\-edge research, Empa's around 1,100 employees make essential contributions to the well\\-being of society for a future worth living. Empa is a research institution of the ETH Domain. The \[Coating Technologies Group\](\< \>) in Empa's Laboratory for Surface Science \\\& Coating Technologies develops next\\-generation functional thin films through innovative deposition processes and high\\-throughput materials screening. \*\*The opportunity\*\* Contribute to groundbreaking research on accelerated thin\\-film and process development for emerging applications such as ferroelectric memory, photonic integrated circuits and next\\-generation telecommunications. You'll work at the exciting intersection of experimental materials science and materials informatics, collaborating in an interdisciplinary team. Your tasks \* Conduct physical vapor deposition experiments using advanced PVD processes such as synchronized HiPIMS \* Perform in\\-depth materials characterization and surface analysis \* Apply and improve high\\-throughput experimental workflows including closed\\-loop thin\\-film optimization \* Apply AI and Machine Learning for data analysis and modelling \* Develop, improve and implement HW/SW concepts and components to automate experiments and enable autonomous experiments The focus of this position is to use advanced PVD processes to develop state\\-of\\-the art thin films, such as piezoelectric and ferroelectric nitrides. You will use synchronized HiPIMS processes to tune the properties and performance of the films. The experiments will be informed by in\\-situ surface and interface analysis. Your work will make use of our group's unique comprehensive infrastructure for materials and device characterization. In addition, the work will benefit from a uni
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